环境量测及改善解决方案:
   Spicer Consulting
   HERZ Co., Ltd.
TEM 样品制备离子减薄机:
   TECHNOORG LINDA
扫描式电子显微镜SEM周边:
   K.E.Development
镀金及镀碳机及冷冻样品控温平台:
   Quorum Technology
奈米图像产生控制系统NPGS
WET-SEM Technology
双枪式高/低能量离子减薄机:
General purpose ion mills - models IV3, IV4   

The IV3/IV4 Ion Milling Systems provide a complete ion milling procedure for TEM sample preparation. The Basic configuration contains two independent and controllable high-energy - TELETWIN - ion guns. The TELETWIN Ion Gun is composed of two Steigerwald type guns, it provides a high density ion or fast atom beam thus the preparation of samples can be performed during a reasonable time even at low angle bombardment. Its Focused High-energy-Ion Gun version allows even higher milling rate. With the application possibility of the low-energy gun the Combined system can also be used for final polishing.
The third generation of the ion beam milling unit - IV3 - was developed to bombard the specimen surface at a low angle as possible. The next version - IV4 - was constructed for speeding up the thinning process. The equipment was designed by microscopists for high quality sample preparation.

General
The IV3/IV4 Ion Milling Systems provide a complete ion milling procedure for TEM sample preparation. The Basic configuration contains two independent and controllable high-energy - TELETWIN - ion guns. The TELETWIN Ion Gun is composed of two Steigerwald type guns, it provides a high density ion or fast atom beam thus the preparation of samples can be performed during a reasonable time even at low angle bombardment. Its Focused High-energy-Ion Gun version allows even higher milling rate. With the application possibility of the low-energy gun the Combined system can also be used for final polishing.

Features

  • Multiple ion sources
  • High milling rates and final polishing capability in one equipment
  • Unique retarding field operation
  • Optional reactive ion milling, liquid nitrogen cooling and ion beam slope cutting